Concept of mask/wafer co-optimization by moving the shot with mask and wafer double simulation to minimize wafer error. VSB shot configurations and its corresponding ...

Computational lithography and mask optimization techniques are at the forefront of enabling the semiconductor industry's continued miniaturisation of integrated circuits. This field encompasses ...

Experts at the Table: Semiconductor Engineering sat down to discuss optical and EUV photomasks issues, as well as the challenges facing the mask business, with Naoya Hayashi, research fellow at DNP; ...

The highly anticipated introduction of extreme ultra-violet (EUV) lithography is reflected in recent surveys conducted by the eBeam Initiative, which will be presented on Sept. 11 at the annual ...

One of the main challenges in developing semiconductor chip technology is making electronic components smaller and more effective. This difficulty is most noticeable in lithography, which is the ...

SANTA CLARA, Calif., March 21, 2023 (GLOBE NEWSWIRE) -- GTC -- NVIDIA today announced a breakthrough that brings accelerated computing to the field of computational lithography, enabling semiconductor ...

Nvidia has developed a software library for computational lithography, which it believes will massively improve chip design development times, and reduce the number of data centers chip fabs have to ...